| A novel removal strategy for copper and arsenic by photooxidation coupled with coprecipitation: Performance and mechanism | |
Wei Ding; Hui Tong; Dan Zhao; Huaili Zheng; Chengshuai Liu ; Jinjun Li; Feng Wu
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| 2020 | |
| Source Publication | Chemical Engineering Journal
 |
| Volume | 401Pages:126102 |
| DOI | 10.1016/j.cej.2020.126102 |
| URL | 查看原文 |
| Language | 英语 |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.gyig.ac.cn/handle/42920512-1/11433 |
| Collection | 环境地球化学国家重点实验室_环境地球化学国家重点实验室_期刊论文 环境地球化学国家重点实验室 |
| Affiliation | 1.College of Environment and Ecology, Chongqing University, Chongqing, 400044, China 2.School of Resources and Environmental Science, Wuhan University, Wuhan, 430079, China 3.State Key Laboratory of Environmental Geochemistry, Institute of Geochemistry, Chinese Academy of Sciences, Guiyang, 550081, China 4.Guangdong Key Laboratory of Agro-environmental Pollution Control and Management, Guangdong Institute of Eco-environmental Science & Technology, Guangzhou 510650, PR China |
| Recommended Citation GB/T 7714 | Wei Ding,Hui Tong,Dan Zhao,et al. A novel removal strategy for copper and arsenic by photooxidation coupled with coprecipitation: Performance and mechanism[J]. Chemical Engineering Journal,2020,401:126102. |
| APA | Wei Ding.,Hui Tong.,Dan Zhao.,Huaili Zheng.,Chengshuai Liu.,...&Feng Wu.(2020).A novel removal strategy for copper and arsenic by photooxidation coupled with coprecipitation: Performance and mechanism.Chemical Engineering Journal,401,126102. |
| MLA | Wei Ding,et al."A novel removal strategy for copper and arsenic by photooxidation coupled with coprecipitation: Performance and mechanism".Chemical Engineering Journal 401(2020):126102. |
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| File Name/Size | DocType | Version | Access | License | ||
| A novel removal stra（1717KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Download | |
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