| A novel removal strategy for copper and arsenic by photooxidation coupled with coprecipitation: Performance and mechanism | |
Wei Ding; Hui Tong; Dan Zhao; Huaili Zheng; Chengshuai Liu ; Jinjun Li; Feng Wu
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| 2020 | |
| 发表期刊 | Chemical Engineering Journal
 |
| 卷号 | 401页码:126102 |
| DOI | 10.1016/j.cej.2020.126102 |
| URL | 查看原文 |
| 语种 | 英语 |
| 引用统计 | |
| 文献类型 | 期刊论文 |
| 条目标识符 | http://ir.gyig.ac.cn/handle/42920512-1/11433 |
| 专题 | 环境地球化学国家重点实验室_环境地球化学国家重点实验室_期刊论文 环境地球化学国家重点实验室 |
| 作者单位 | 1.College of Environment and Ecology, Chongqing University, Chongqing, 400044, China 2.School of Resources and Environmental Science, Wuhan University, Wuhan, 430079, China 3.State Key Laboratory of Environmental Geochemistry, Institute of Geochemistry, Chinese Academy of Sciences, Guiyang, 550081, China 4.Guangdong Key Laboratory of Agro-environmental Pollution Control and Management, Guangdong Institute of Eco-environmental Science & Technology, Guangzhou 510650, PR China |
| 推荐引用方式 GB/T 7714 | Wei Ding,Hui Tong,Dan Zhao,et al. A novel removal strategy for copper and arsenic by photooxidation coupled with coprecipitation: Performance and mechanism[J]. Chemical Engineering Journal,2020,401:126102. |
| APA | Wei Ding.,Hui Tong.,Dan Zhao.,Huaili Zheng.,Chengshuai Liu.,...&Feng Wu.(2020).A novel removal strategy for copper and arsenic by photooxidation coupled with coprecipitation: Performance and mechanism.Chemical Engineering Journal,401,126102. |
| MLA | Wei Ding,et al."A novel removal strategy for copper and arsenic by photooxidation coupled with coprecipitation: Performance and mechanism".Chemical Engineering Journal 401(2020):126102. |
| 条目包含的文件 | 下载所有文件 | |||||
| 文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
| A novel removal stra（1717KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | 浏览 下载 | |
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