Knowledge Management System Of Institute of Geochemistry,CAS
Nano-Silver Paste with a Low Sintering Temperature | |
Shi Yong Luo; Juan Chen; Wen Cai Xu; Xin Lin Zhang; Li Xia Huo | |
2012 | |
Source Publication | Advanced Materials Research
![]() |
Volume | 391-392Pages:745-748 |
Abstract | A paste with as low as 300°C sintering temperature was prepared by using nano silver particles and nitrocellulose ethyl acetate solution. The rheological and thixotropic behaviors of the typical paste were characterized and their effects on the screen printing ability were analyzed in details. The paste demonstrates a typical shear thinning rheological behavior and thixotropic of pseudoplastic fluid. The apparent viscosity decreased rapidly with the increase of the shear rate. The paste is proper for the manufacturing electrical components at a low sintering temperature as low as 300°C. |
Keyword | Low Sintering Temperature nano-silver Paste rheological Behavior thick Film |
Indexed By | SCI |
Language | 英语 |
Document Type | 期刊论文 |
Identifier | http://ir.gyig.ac.cn/handle/42920512-1/11011 |
Collection | 地球内部物质高温高压实验室 |
Affiliation | 1.Low Sintering Temperature, Nano-Silver Paste, Rheological Behavior, Thick Film 2.The Laboratory for study of Earth's interior and Geo fluids, Institute of Geochemistry, Chinese Academy of Sciences, Guiyang, 550002, P R China |
Recommended Citation GB/T 7714 | Shi Yong Luo;Juan Chen;Wen Cai Xu;Xin Lin Zhang;Li Xia Huo. Nano-Silver Paste with a Low Sintering Temperature[J]. Advanced Materials Research,2012,391-392:745-748. |
APA | Shi Yong Luo;Juan Chen;Wen Cai Xu;Xin Lin Zhang;Li Xia Huo.(2012).Nano-Silver Paste with a Low Sintering Temperature.Advanced Materials Research,391-392,745-748. |
MLA | Shi Yong Luo;Juan Chen;Wen Cai Xu;Xin Lin Zhang;Li Xia Huo."Nano-Silver Paste with a Low Sintering Temperature".Advanced Materials Research 391-392(2012):745-748. |
Files in This Item: | ||||||
File Name/Size | DocType | Version | Access | License | ||
Nano-silver Paste wi(1394KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text |
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment